The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2014
Filed:
Mar. 19, 2012
Multiple measurement techniques including focused beam scatterometry for characterization of samples
Applicants:
Robert Gregory Wolf, Hackettstown, NJ (US);
Michael J. Kotelyanskii, Chatham, NJ (US);
Inventors:
Robert Gregory Wolf, Hackettstown, NJ (US);
Michael J. Kotelyanskii, Chatham, NJ (US);
Assignee:
Rudolph Technologies, Inc., Flanders, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 4/00 (2006.01); G01N 21/21 (2006.01); G01B 11/02 (2006.01); G01B 11/06 (2006.01);
U.S. Cl.
CPC ...
G01N 21/211 (2013.01); G01N 2021/213 (2013.01); G01B 11/02 (2013.01); G01B 11/0641 (2013.01);
Abstract
A system for monitoring thin-film fabrication processes is herein disclosed. Diffraction of incident light is measured and the results are compared to a predictive model based on at least one idealized or nominal structure. The model and/or the measurement of diffracted incident light may be modified using the output of one or more additional metrology systems.