The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2014
Filed:
Feb. 12, 2010
Ilya V. Bezel, Sunnyvale, CA (US);
Anatoly Shchemelinin, Pleasanton, CA (US);
Eugene Shifrin, Sunnyvale, CA (US);
Matthew W. Derstine, Los Gatos, CA (US);
Richard W. Solarz, Danville, CA (US);
Ilya V. Bezel, Sunnyvale, CA (US);
Anatoly Shchemelinin, Pleasanton, CA (US);
Eugene Shifrin, Sunnyvale, CA (US);
Matthew W. Derstine, Los Gatos, CA (US);
Richard W. Solarz, Danville, CA (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
A method of sustaining a plasma, by focusing a first wavelength of electromagnetic radiation into a gas within a volume, where the first wavelength is substantially absorbed by a first species of the gas and delivers energy into a first region of a plasma having a first size and a first temperature. A second wavelength of electromagnetic radiation is focused into the first region of the plasma, where the second wavelength is different than the first wavelength and is substantially absorbed by a second species of the gas and delivers energy into a second region of the plasma region within the first region of the plasma having a second size that is smaller than the first size and a second temperature that is greater than the first temperature.