The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2014
Filed:
Feb. 04, 2008
Takashi Ogawa, Chiba, JP;
Yo Yamamoto, Chiba, JP;
Hiroshi Matsumura, Chiba, JP;
SII NanoTechnology, , JP;
Abstract
A charged particle beam apparatus which is able to adjust charged particle optics easily in a short time with a high degree of accuracy and a method of adjusting charged particle optics are provided. A charged particle beam apparatusincludes a charged particle source, charged particle opticsconfigured to set the ion beam I to a bean characteristic value corresponding to an input value to cause a sample to be irradiated therewith, scanning meansconfigured to be able to move the irradiation point of the charged particle beam I relatively with each other, observing meansbeing capable of obtaining an image, and a control unit, and the control unitincludes spot pattern forming meansconfigured to set the input value to different values and cause the sample to be irradiated with the charged particle beam I by a plurality of times at different positions to form a plurality of spot patterns and spot pattern analyzing meansconfigured to select a spot pattern having a smallest characteristic value, and sets the input values of the charged particle opticsto a value equal to the input value corresponding to the selected spot pattern.