The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 15, 2014

Filed:

Sep. 23, 2011
Applicants:

Ji-young Jeong, Uiwang-si, KR;

Min-kook Chung, Uiwang-si, KR;

Hyun-yong Cho, Uiwang-si, KR;

Yong-sik Yoo, Uiwang-si, KR;

Jeong-woo Lee, Uiwang-si, KR;

Jong-hwa Lee, Uiwang-si, KR;

Hwan-sung Cheon, Uiwang-si, KR;

Soo-young Kim, Seongnam-si, KR;

Young-ho Kim, Yongin-si, KR;

Jae-hyun Kim, Yongin-si, KR;

Su-min Park, Seoul, KR;

Inventors:

Ji-Young Jeong, Uiwang-si, KR;

Min-Kook Chung, Uiwang-si, KR;

Hyun-Yong Cho, Uiwang-si, KR;

Yong-Sik Yoo, Uiwang-si, KR;

Jeong-Woo Lee, Uiwang-si, KR;

Jong-Hwa Lee, Uiwang-si, KR;

Hwan-Sung Cheon, Uiwang-si, KR;

Soo-Young Kim, Seongnam-si, KR;

Young-Ho Kim, Yongin-si, KR;

Jae-Hyun Kim, Yongin-si, KR;

Su-Min Park, Seoul, KR;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/023 (2006.01); G03F 7/022 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0226 (2013.01); G03F 7/0233 (2013.01);
Abstract

Disclosed are a novel phenol compound comprising a compound represented by Chemical Formula 1, a compound represented by Chemical Formula 2, or a combination thereof, and a positive photosensitive resin composition including the same.


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