The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2014
Filed:
Feb. 02, 2010
Sander Frederik Wuister, Eindhoven, NL;
Johan Frederik Dijksman, Weert, NL;
Yvonne Wendela Kruijt-stegeman, Eindhoven, NL;
Jeroen Herman Lammers, Eindhoven, NL;
Leendert Van Der Tempel, Eindhoven, NL;
Sander Frederik Wuister, Eindhoven, NL;
Johan Frederik Dijksman, Weert, NL;
Yvonne Wendela Kruijt-Stegeman, Eindhoven, NL;
Jeroen Herman Lammers, Eindhoven, NL;
Leendert Van Der Tempel, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An imprint lithography method is provided. The method includes undertaking first and second imprints, which comprises for each imprint: for an area of a substrate provided with a plurality of drops of imprintable medium in respectively first and second configurations, imprinting a pattern in the imprintable medium using a same imprint template, pockets being formed between the drops of the imprintable medium, the imprint template and the substrate during the imprinting of the pattern, wherein the first configuration of drops of imprintable medium is different from the second configuration of drops of imprintable medium, such that pockets formed during the second imprint are formed at different locations relative to the imprint template to pockets formed during the first imprint.