The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 15, 2014

Filed:

Jun. 12, 2008
Applicants:

Kazuaki Kozasa, Omura, JP;

Kosuke Miyoshi, Omura, JP;

Inventors:

Kazuaki Kozasa, Omura, JP;

Kosuke Miyoshi, Omura, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 15/00 (2006.01); C30B 21/06 (2006.01); C30B 27/02 (2006.01); C30B 30/04 (2006.01); C30B 23/00 (2006.01); C30B 25/00 (2006.01); C30B 28/12 (2006.01); C30B 28/14 (2006.01); C30B 35/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A manufacturing method of an epitaxial silicon wafer is provided. The epitaxial silicon wafer includes: a substrate cut out from a silicon monocrystal that has been manufactured, doped with nitrogen and pulled up in accordance with Czochralski method; and an epitaxial layer formed on the substrate. The manufacturing method includes: cleaning a surface of the substrate with fluorinated acid by spraying onto the surface of the substrate fluorinated acid vaporized by a bubbling tank of a substrate cleaning apparatus; and forming an epitaxial layer on the cleaned surface of the substrate.


Find Patent Forward Citations

Kozasa, Kazuaki. (2014). Manufacturing method of epitaxial silicon wafer and substrate cleaning apparatus (U.S. Patent No. 8696809). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8696809

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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