The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2014
Filed:
Aug. 03, 2011
Masami Shibagaki, Kawasaki, JP;
Kaori Mashimo, Kawasaki, JP;
Masami Shibagaki, Kawasaki, JP;
Kaori Mashimo, Kawasaki, JP;
Canon Anelva Corporation, Kawasaki-shi, JP;
Abstract
To provide a temperature control method capable of equivalently maintaining qualities of substrates even when treated substrates are continuously carried in a treatment container in the case in which activation annealing treatment is performed by an electron impact heating method. The temperature control method of a substrate heat treating apparatus performing annealing treatment of a substrate by an electron impact heating method includes performing preheating for heating the inside of a treating chamberat a higher temperature than the annealing treatment temperature of a substrateand over a longer period of time than the annealing treatment time and then, cools the inside of the treatment container to a temperature lower than the annealing treatment temperature, prior to carrying the substratein a vacuum exhaustible containerand carrying the substratein the preheated vacuum exhaustible treatment containerand then, increasing a temperature of the treatment container to the annealing treatment temperature to perform the annealing treatment.