The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2014
Filed:
Jun. 09, 2006
Applicants:
Dah-chuen Ho, Jhubei, TW;
Eugene Chu, Hsin-chu hsien, TW;
Yuh-haw Chang, Shulin, TW;
Fei-yun Chen, Hsinchu, TW;
Michael Wu, Kaohsiung, TW;
Eric Chao, Bali Township, Taipei County, TW;
Inventors:
Dah-Chuen Ho, Jhubei, TW;
Eugene Chu, Hsin-chu hsien, TW;
Yuh-Haw Chang, Shulin, TW;
Fei-Yun Chen, Hsinchu, TW;
Michael Wu, Kaohsiung, TW;
Eric Chao, Bali Township, Taipei County, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co. Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01); G02B 26/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method comprising providing a first substrate and forming a first sacrificial layer over the first substrate, the first sacrificial layer comprising a curved surface portion, and forming a curved micromirror by depositing a reflective material over at the curved surface portion.