The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2014
Filed:
Jul. 29, 2011
Satoshi Ishii, Hitachi, JP;
Masahiko Ogino, Hitachi, JP;
Noritake Shizawa, Ninomiya, JP;
Kyoichi Mori, Oiso, JP;
Akihiro Miyauchi, Hitachi, JP;
Satoshi Ishii, Hitachi, JP;
Masahiko Ogino, Hitachi, JP;
Noritake Shizawa, Ninomiya, JP;
Kyoichi Mori, Oiso, JP;
Akihiro Miyauchi, Hitachi, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The present invention provides a nano-imprinting resin stamper including a micro structure layer on a transmissive support basal material, the micro structure layer being formed of a polymer of a resin composition that contains a silsesquioxane derivative as a major constituent having a plurality of polymerizable functional groups, another polymerizable resin component having a plurality of polymerizable functional groups and different from the silsesquioxane derivative, and a photopolymerizable initiator, in which the content percentage of the photopolymerizable initiator is equal to or more than 0.3 mass % and equal to or less than 3 mass % relative to a total mass of the silsesquioxane derivative and the polymerizable resin component, and the micro structure layer permits equal to or more than 80% of light to pass therethrough at a wavelength of 365 nm.