The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2014
Filed:
May. 20, 2010
Kazunori Mori, Iruma-gun, JP;
Yuji Hagiwara, Kawagoe, JP;
Masashi Nagamori, Fujimino, JP;
Yoshimi Isono, Kawagoe, JP;
Satoru Narizuka, Saitama, JP;
Kazuhiko Maeda, Tokyo, JP;
Kazunori Mori, Iruma-gun, JP;
Yuji Hagiwara, Kawagoe, JP;
Masashi Nagamori, Fujimino, JP;
Yoshimi Isono, Kawagoe, JP;
Satoru Narizuka, Saitama, JP;
Kazuhiko Maeda, Tokyo, JP;
Central Glass Company, Limited, Ube-shi, JP;
Abstract
A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. In the formula, Rrepresents a polymerizable double bond-containing group; Rrepresents a fluorine atom or a fluorine-containing alkyl group; Rrepresents a substituted or unsubstituted alkyl group or the like; and Wrepresents a single bond, a substituted or unsubstituted methylene group or the like.