The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2014
Filed:
Dec. 16, 2009
Applicants:
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Johannes Christiaan Maria Jasper, Veldhoven, NL;
Inventors:
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Johannes Christiaan Maria Jasper, Veldhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/58 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/705 (2013.01); G03F 7/706 (2013.01); G03F 7/70591 (2013.01); G03F 7/70891 (2013.01);
Abstract
In a lithographic method, a characteristic of a projection system is measured before and after periods of heating (exposures) and cooling to provide data to calibrate a model of lens heating. The model has a part modeling the effect of cooling and a part modeling the effect of heating on the characteristic.