The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2014
Filed:
Oct. 14, 2011
Applicant:
Takayuki Komiya, Nirasaki, JP;
Inventor:
Takayuki Komiya, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/44 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for forming a film includes the steps of: placing an object to be processed into a processing container; and generating M(BH)gas by feeding Hgas as carrier gas into a raw material container in which solid M(BH)(where M is Zr or Hf) is accommodated to introduce a mixture gas of Hgas and M(BH)gas having a volume ratio of flow rates (H/M(BH)) of 2 or more into the processing container, and deposit a MBfilm (where M is Zr or Hf and x is 1.8 to 2.5) on the object using a thermal CVD.
Komiya, Takayuki. (2014). Method for forming a film including zr, hf or the like, and method for manufacturing a semiconductor device using the same (U.S. Patent No. 8679978). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8679978
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile