The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2014
Filed:
Mar. 15, 2012
Applicants:
Jeffrey P. Gambino, Westford, VT (US);
Derrick Liu, Winooski, VT (US);
Dale W. Martin, Hyde Park, VT (US);
Gerd Pfeiffer, Poughquag, NY (US);
Inventors:
Jeffrey P. Gambino, Westford, VT (US);
Derrick Liu, Winooski, VT (US);
Dale W. Martin, Hyde Park, VT (US);
Gerd Pfeiffer, Poughquag, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods are provided for fine tuning substrate resistivity. The method includes measuring a resistivity of a substrate after an annealing process, and fine tuning a subsequent annealing process to achieve a target resistivity of the substrate. The fine tuning is based on the measured resistivity.