The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 25, 2014

Filed:

Apr. 08, 2013
Applicant:

Siltronic Ag, Munich, DE;

Inventor:

Piotr Filar, Marktl, DE;

Assignee:

Siltronic AG, Munich, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C30B 15/14 (2006.01); C30B 29/06 (2006.01); C30B 15/00 (2006.01); C30B 15/10 (2006.01); C30B 15/20 (2006.01); C30B 15/30 (2006.01);
U.S. Cl.
CPC ...
C30B 15/14 (2013.01); C30B 29/06 (2013.01); C30B 15/00 (2013.01); C30B 15/10 (2013.01); C30B 15/203 (2013.01); C30B 15/206 (2013.01); C30B 15/305 (2013.01);
Abstract

Silicon single crystals are grown from the melt by providing the melt in a crucible; imposing a horizontal magnetic field on the melt; directing a gas between the single crystal and a heat shield to a melt free surface, and controlling the gas to flow over a region of the melt free surface extending in a direction substantially perpendicular to the magnetic induction. A suitable apparatus has a crucible for holding the melt; a heat shield surrounding the silicon single crystal having a lower end which is connected to a bottom cover facing a melt free surface and a non-axisymmetric shape with respect to a crucible axis, such that gas which is directed between the crystal and the heat shield to the melt free surface is forced to flow over a region of the melt which extends substantially perpendicular to the magnetic induction.


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