The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Feb. 14, 2006
Marinus Johanes Maria Van Dam, Venlo, NL;
Wilhelmus Petrus DE Boeij, Veldhoven, NL;
Johannes Wilhelmus Wilhelmus DE Klerk, Eindhoven, NL;
Marinus Johanes Maria Van Dam, Venlo, NL;
Wilhelmus Petrus De Boeij, Veldhoven, NL;
Johannes Wilhelmus Wilhelmus De Klerk, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illuminator configured to provide a projection beam of radiation and a polarization controller configured to control an intensity of a preferred state of polarization of the projection beam. The lithographic apparatus further includes a support configured to hold a patterning device. The patterning device configured to pattern the projection beam according to a desired pattern. The apparatus also includes a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate to form a patterned image on the substrate.