The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Oct. 14, 2011
Frank Johannes Jacobus Van Boxtel, Eindhoven, NL;
Marinus Johannes Maria Van Dam, Venlo, NL;
Johannes Christiaan Maria Jasper, Veldhoven, NL;
Ronald Van Der Ham, Maarheeze, NL;
Sergei Yurievich Shulepov, Eindhoven, NL;
Gerben Pieterse, Eindhoven, NL;
Marco Baragona, Delft, IT;
Pieter Debrauwer, Vught, NL;
Antonius Arnoldus Henricus Van Der Steen, Best, NL;
Frank Johannes Jacobus Van Boxtel, Eindhoven, NL;
Marinus Johannes Maria Van Dam, Venlo, NL;
Johannes Christiaan Maria Jasper, Veldhoven, NL;
Ronald Van Der Ham, Maarheeze, NL;
Sergei Yurievich Shulepov, Eindhoven, NL;
Gerben Pieterse, Eindhoven, NL;
Marco Baragona, Delft, IT;
Pieter Debrauwer, Vught, NL;
Antonius Arnoldus Henricus Van Der Steen, Best, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.