The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Aug. 10, 2012
Taichi Kiuchi, Tokyo, JP;
Takahisa Hasegawa, Tokyo, JP;
Taichi Kiuchi, Tokyo, JP;
Takahisa Hasegawa, Tokyo, JP;
JEOL Ltd., Tokyo, JP;
Abstract
There is disclosed a lithography method and system implemented by a charged particle beam passed through a shaping slit member having plural circular apertures of different diameters. The method and system operate to delineate a circular pattern by shooting the shaped circular beam passed through the desired circular aperture onto a workpiece. The method and system consists of causing circular beams shaped using different ones of the circular apertures to be shot onto the workpiece such that the circular beams are coincident with each other in center position to thereby delineate a circular pattern of a desired size. Consequently, circular patterns in a wide range of sizes can be obtained, although a limited number of circular apertures are used.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile