The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2014
Filed:
Aug. 17, 2009
Seong Hyun Kim, Daejeon, KR;
Sang Chul Lim, Daejeon, KR;
Yong Suk Yang, Daejeon, KR;
Zin Sig Kim, Daejeon, KR;
Doo Hyeb Youn, Daejeon, KR;
Seong Hyun Kim, Daejeon, KR;
Sang Chul Lim, Daejeon, KR;
Yong Suk Yang, Daejeon, KR;
Zin Sig Kim, Daejeon, KR;
Doo Hyeb Youn, Daejeon, KR;
Electronics and Telecommunications Research Institute, Daejeon, KR;
Abstract
Provided is a method of forming a fine pattern of a polymer thin film using a phenomenon that another material having a large difference in surface energy in comparison with a polymer thin film pattern is dewetted on the polymer thin film pattern. Two polymer materials having a large difference in surface energy can be applied to readily and conveniently form a fine pattern of a polymer thin film of micrometer or sub-micrometer grade.