The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2014
Filed:
Apr. 11, 2012
Applicants:
Chih-hong Hwang, New Taipei, TW;
Chun-lin Chang, Jhubei, TW;
Chi-ming Yang, Hsinchu, TW;
Chin-hsiang Lin, Hsin-chu, TW;
Wen-yu Ku, Hsinchu, TW;
Inventors:
Chih-Hong Hwang, New Taipei, TW;
Chun-Lin Chang, Jhubei, TW;
Chi-Ming Yang, Hsinchu, TW;
Chin-Hsiang Lin, Hsin-chu, TW;
Wen-Yu Ku, Hsinchu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 27/00 (2006.01); A61N 5/00 (2006.01); G21G 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An apparatus comprises an ionization chamber for providing ions during a process of ion implantation, and an electron beam source device inside the ionization chamber. The electron beam source device comprises a field emission array having a plurality of emitters for generating electrons in vacuum under an electric field.