The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2014
Filed:
Aug. 24, 2011
Keita Kato, Shizuoka, JP;
Sou Kamimura, Shizuoka, JP;
Yuichiro Enomoto, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
Shohei Kataoka, Shizuoka, JP;
Shoichi Saitoh, Shizuoka, JP;
Keita Kato, Shizuoka, JP;
Sou Kamimura, Shizuoka, JP;
Yuichiro Enomoto, Shizuoka, JP;
Kaoru Iwato, Shizuoka, JP;
Shohei Kataoka, Shizuoka, JP;
Shoichi Saitoh, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided is a method of forming pattern including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing a first organic solvent, wherein in the developer, particles each having a diameter of 0.3 μm or greater amount to a density of 30 particles/ml or less.