The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2014
Filed:
Jun. 11, 2012
Ulrich Wegmann, Koenigsbronn, DE;
Ulrich Wegmann, Koenigsbronn, DE;
CARL ZEISS SMT GmbH, Oberkochen, DE;
Abstract
Immersion objective arrangement including an objective, an immersion medium and an optical scattering disk, and associated method. The optical scattering disk includes a transparent substrate () and a light scattering layer () adjoining a surface of the substrate and having light-scattering-active particles (). The light scattering layer has an embedding medium () which is optically denser than air and directly adjoins the facing surface of the substrate without intervening air gaps and by which the light-scattering-active particles are surrounded. Such optical scattering disks may be used, e.g., in apparatuses for wavefront measurement of high-aperture microlithography projection objectives employing lateral shearing interferometry.