The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2014
Filed:
Feb. 28, 2011
Hi-kuk Lee, Yongin-si, KR;
Sang-hyun Yun, Suwon-si, KR;
Cha-dong Kim, Cheonan-si, KR;
Jung-in Park, Suwon-si, KR;
Deok-man Kang, Seongnam-si, KR;
Youn-suk Kim, Yongin-si, KR;
Sae-tae OH, Pyeongtaek-si, KR;
Hi-Kuk Lee, Yongin-si, KR;
Sang-Hyun Yun, Suwon-si, KR;
Cha-Dong Kim, Cheonan-si, KR;
Jung-In Park, Suwon-si, KR;
Deok-Man Kang, Seongnam-si, KR;
Youn-Suk Kim, Yongin-si, KR;
Sae-Tae Oh, Pyeongtaek-si, KR;
Samsung Display Co., Ltd., Yongin, KR;
AZ Electronic Materials (Korea) Ltd., Seoul, KR;
Abstract
A photoresist composition is provided. The photoresist composition includes an alkali-soluble resin; a photosensitizer containing a first compound that contains a diazonaphthoquinone represented by Formula 1 and a second compound that contains a diazonaphthoquinone represented by Formula 2; and a solvent. andR1 is selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 4 carbons, an alkenyl group having 2 to 4 carbons, a cycloalkyl group having 3 to 8 carbons, and an aryl group having 6 to 12 carbons, and R2 is selected from the group consisting of Cl, F, Br, and I.