The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2014
Filed:
Mar. 12, 2009
Kotaro Tsurusaki, Tosu, JP;
Hiroshi Tanaka, Tosu, JP;
Takayuki Toshima, Koshi, JP;
Kazuyoshi Eshima, Tosu, JP;
Kotaro Tsurusaki, Tosu, JP;
Hiroshi Tanaka, Tosu, JP;
Takayuki Toshima, Koshi, JP;
Kazuyoshi Eshima, Tosu, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
A plurality of process liquid supply nozzlesare arranged at different levels on right and left sides of a semiconductor wafer W in a process bath. A discharge port of each of the nozzlesis directed toward the semiconductor wafer W. In accordance with a predetermined procedure, a process liquid is discharged from one or more nozzlesselected from the plurality of nozzles. In order to perform a chemical liquid treatment, a chemical liquid is discharged from the lowermost nozzle, for example, and thereafter, the nozzleson the upper levels sequentially discharge the chemical liquid. In order to perform a rinse liquid treatment by replacing the chemical liquid in the process bathwith a rinse liquid, the rinse liquid is discharged from the lowermost nozzleat first, for example. Thereafter, the rinse liquid is discharged from all the nozzles. In this manner, efficiency and uniformity in the liquid treatment can be improved.