The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2014
Filed:
Apr. 30, 2010
Chi-ta LU, Sanxing Township, Yilan County, TW;
Peng-ren Chen, Hsinchu, TW;
Dong-hsu Cheng, Tainan, TW;
Chang-jyh Hsieh, Hsin-Chu, TW;
Chi-Ta Lu, Sanxing Township, Yilan County, TW;
Peng-Ren Chen, Hsinchu, TW;
Dong-Hsu Cheng, Tainan, TW;
Chang-Jyh Hsieh, Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
The present disclosure provides for many different embodiments. A mask fabrication method and system is provided. The method and system identify critical areas of an integrated circuit (IC) design layout that has undergone optical proximity correction. The critical areas are areas of the OPCed IC design layout that are at risk for hot spots. A lithography process check is then performed on the critical areas of the OPCed IC design layout.