The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2014
Filed:
Sep. 28, 2011
Mihaela Ioana Popovici, Leuven, BE;
Johan Swerts, Kessel-lo, BE;
Jorge Kittl, Hamme-Mille, BE;
Sven Van Elshocht, Leuven, BE;
Mihaela Ioana Popovici, Leuven, BE;
Johan Swerts, Kessel-lo, BE;
Jorge Kittl, Hamme-Mille, BE;
Sven Van Elshocht, Leuven, BE;
IMEC, Leuven, BE;
Abstract
Methods of manufacturing metal-insulator-metal capacitor structures, and the metal-insulator-metal capacitor structures obtained, are disclosed. In one embodiment, a method includes providing a substrate, forming on the substrate a first metal layer comprising a first metal, and using atomic layer deposition with an HO oxidant to deposit on the first metal layer a protective layer comprising TiO. The method further includes using atomic layer deposition with an Ooxidant to deposit on the protective layer a dielectric layer of a dielectric material, and forming on the dielectric layer a second metal layer comprising a second metal. In another embodiment, a metal-insulator-metal capacitor includes a bottom electrode comprising a first metal, a protective layer deposited on the bottom electrode and comprising TiO, a dielectric layer deposited on the protective layer and comprising a dielectric material, and a top electrode formed on the dielectric layer and comprising a second metal.