The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 11, 2014

Filed:

Jul. 09, 2013
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Emre Alptekin, Fishkill, NY (US);

Sameer H. Jain, Ossining, NY (US);

Reinaldo A. Vega, Wappingers Falls, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01); H01L 21/3205 (2006.01);
U.S. Cl.
CPC ...
Abstract

One embodiment of the present invention comprises a transistor having a source/drain region within a substrate, an extension region within the substrate adjoining the source/drain region and extending toward a gate on the substrate, and a dielectric spacer against the gate wherein the dielectric spacer covers at least part of the extension region. A silicide intermix layer is formed over both the source/drain region and a portion of the extension region. A silicide contact is formed through the silicide intermix layer over the source/drain region.


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