The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2014
Filed:
Jan. 23, 2008
Applicants:
Kazutoshi Hotta, Ichinomiya, JP;
Kanji Kawata, Inuyama, JP;
Inventors:
Kazutoshi Hotta, Ichinomiya, JP;
Kanji Kawata, Inuyama, JP;
Assignee:
Fujimi Incorporated, Kiyosu-shi, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K 13/08 (2006.01); C09K 13/04 (2006.01); C09K 13/06 (2006.01);
U.S. Cl.
CPC ...
Abstract
A polishing composition contains a vanadate such as ammonium vanadate, sodium vanadate, and potassium vanadate and an oxygen donor such as hydrogen peroxide and ozone. It is preferable that the polishing composition further contains at least either one of abrasive grains and a pH adjusting agent. The polishing composition can be suitably used for polishing a silicon carbide wafer such as a hexagonal silicon carbide single crystal wafer.