The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2014

Filed:

May. 14, 2012
Applicants:

Sukti Chatterjee, Cupertino, CA (US);

Annamalai Lakshmanan, Fremont, CA (US);

Joe Griffith Cruz, San Jose, CA (US);

Pravin K. Narwankar, Sunnyvale, CA (US);

Inventors:

Sukti Chatterjee, Cupertino, CA (US);

Annamalai Lakshmanan, Fremont, CA (US);

Joe Griffith Cruz, San Jose, CA (US);

Pravin K. Narwankar, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/36 (2006.01); H01L 21/20 (2006.01); H01L 21/322 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods for depositing a material atop a substrate are provided herein. In some embodiments, a method of depositing a material atop a substrate may include exposing a substrate to a silicon containing gas and a reducing gas; increasing a flow rate of the silicon containing gas while decreasing a flow rate of the reducing gas to form a first layer; and depositing a second layer atop the first layer.


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