The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2014

Filed:

Dec. 02, 2011
Applicants:

Daiju Shiono, Kawasaki, JP;

Takahiro Dazai, Kawasaki, JP;

Sanae Furuya, Kawasaki, JP;

Tomoyuki Hirano, Kawasaki, JP;

Takayoshi Mori, Kawasaki, JP;

Inventors:

Daiju Shiono, Kawasaki, JP;

Takahiro Dazai, Kawasaki, JP;

Sanae Furuya, Kawasaki, JP;

Tomoyuki Hirano, Kawasaki, JP;

Takayoshi Mori, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/028 (2006.01); G03F 7/033 (2006.01); G03F 7/039 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A resist composition for immersion exposure, including a base component that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component that generates acid upon exposure, and a fluorine-containing compound represented by a general formula (c-1) that is decomposable in an alkali developing solution: wherein Rrepresents an organic group which may contain a polymerizable group, with the proviso that said polymerizable group has a carbon-carbon multiple bond, and the carbon atoms forming the multiple bond are not directly bonded to the carbon atom within the —C(═O)— group in general formula (c-1); and Rrepresents an organic group having a fluorine atom.


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