The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2014
Filed:
Dec. 12, 2011
Applicants:
Yoba Amoah, Fairfax, VT (US);
Graham M. Bates, Waterbury, VT (US);
Joseph P. Hasselbach, Burlington, VT (US);
Thomas L. Mcdevitt, Underhill, VT (US);
Eva A. Shah, Essex Junction, VT (US);
Inventors:
Yoba Amoah, Fairfax, VT (US);
Graham M. Bates, Waterbury, VT (US);
Joseph P. Hasselbach, Burlington, VT (US);
Thomas L. McDevitt, Underhill, VT (US);
Eva A. Shah, Essex Junction, VT (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/461 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of manufacturing a semiconductor structure includes varying local chemical mechanical polishing (CMP) abrading rates of an insulator film by selectively varying a carbon content of the insulator film.