The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2014
Filed:
Aug. 07, 2009
Applicants:
Yuli Vladimirsky, Weston, CT (US);
James H. Walsh, Newtown, CT (US);
Inventors:
Yuli Vladimirsky, Weston, CT (US);
James H. Walsh, Newtown, CT (US);
Assignee:
ASML Holding N.V., Veldhoven, NL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G03B 27/32 (2006.01); G03B 27/42 (2006.01); G03B 27/52 (2006.01); G03B 27/80 (2006.01);
U.S. Cl.
CPC ...
Abstract
Systems and methods are provided for inspecting an object surface. An illumination source illuminates the object surface. An optic intercepts scattered light from the illuminated object surface and projects a real image of an area of the object surface. A sensor receives the projected real image. A computer system, coupled to the sensor, stores and analyzes the real image. The real image is processed to detect particles located on the object surface. This arrangement is particularly useful for detecting contaminants or defects on a reticle of a lithography device.