The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2014

Filed:

May. 25, 2012
Applicants:

Rahul Sen, Lexington, MA (US);

Ramesh Sivarajan, Shrewsbury, MA (US);

Thomas Rueckes, Rockport, MA (US);

Brent M. Segal, Woburn, MA (US);

Inventors:

Rahul Sen, Lexington, MA (US);

Ramesh Sivarajan, Shrewsbury, MA (US);

Thomas Rueckes, Rockport, MA (US);

Brent M. Segal, Woburn, MA (US);

Assignee:

Nantero Inc., Woburn, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 31/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

Certain spin-coatable liquids and application techniques are described, which can be used to form nanotube films or fabrics of controlled properties. A spin-coatable liquid for formation of a nanotube film includes a liquid medium containing a controlled concentration of purified nanotubes, wherein the controlled concentration is sufficient to form a nanotube fabric or film of preselected density and uniformity, and wherein the spin-coatable liquid comprises less than 1×10atoms/cmof metal impurities. The spin-coatable liquid is substantially free of particle impurities having a diameter of greater than about 500 nm.


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