The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2014
Filed:
Sep. 28, 2010
Damien Slevin, Salem, OR (US);
Brad Laird, Sherwood, OR (US);
Curtis Bailey, West Linn, OR (US);
Ming LI, West Linn, OR (US);
Sirish Reddy, Hillsboro, OR (US);
James Sims, Tigard, OR (US);
Mohamed Sabri, Beaverton, OR (US);
Saangrut Sangplug, Sherwood, OR (US);
Damien Slevin, Salem, OR (US);
Brad Laird, Sherwood, OR (US);
Curtis Bailey, West Linn, OR (US);
Ming Li, West Linn, OR (US);
Sirish Reddy, Hillsboro, OR (US);
James Sims, Tigard, OR (US);
Mohamed Sabri, Beaverton, OR (US);
Saangrut Sangplug, Sherwood, OR (US);
Novellus Systems Inc., San Jose, CA (US);
Abstract
A vapor delivery system for supplying vapor to a chamber in a plasma-enhanced chemical vapor deposition (PECVD) system includes a vapor supply that supplies vapor by vaporizing at least one liquid precursor in a carrier gas. A first path includes a first filter that filters the vapor flowing from the vapor supply to the chamber. At least one second path is parallel to the first path and includes a second filter that filters vapor flowing from the vapor supply to the chamber. A plurality of valves are configured to switch delivery of the vapor to the chamber between the first path and the second path.