The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2014
Filed:
Oct. 27, 2008
Applicants:
Windy Lynn Farnsworth, New Milford, CT (US);
Santiago E. Del Puerto, Milton, NY (US);
Samir A. Nayfeh, Shrewsbury, MA (US);
Inventors:
Windy Lynn Farnsworth, New Milford, CT (US);
Santiago E. Del Puerto, Milton, NY (US);
Samir A. Nayfeh, Shrewsbury, MA (US);
Assignee:
ASML Holding N.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract
In a lithographic apparatus, dampers are provided that may be used within mounts for optical elements in order to damp the motion of the optical element relative to the component to which it is mounted.
Farnsworth, Windy. (2014). Lithographic apparatus, projection system and damper for use in a lithographic apparatus and device manufacturing method (U.S. Patent No. 8625070). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8625070
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile