The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2013

Filed:

Oct. 28, 2010
Applicants:

Yimin Hsu, Sunnyvale, CA (US);

Aron Pentek, San Jose, CA (US);

Thomas Roucoux, San Jose, CA (US);

Jing Zhang, Los Altos, CA (US);

Honglin Zhu, Fremont, CA (US);

Inventors:

Yimin Hsu, Sunnyvale, CA (US);

Aron Pentek, San Jose, CA (US);

Thomas Roucoux, San Jose, CA (US);

Jing Zhang, Los Altos, CA (US);

Honglin Zhu, Fremont, CA (US);

Assignee:

HGST Netherlands, B.V., Amsterdam, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/31 (2006.01);
U.S. Cl.
CPC ...
Abstract

Magnetic write heads and corresponding fabrication methods for bi-layer wrap around shields resulting in dissimilar shield layer widths are disclosed. A gap structure is formed around a main write pole for a magnetic write head. A wrap around shield for the main write pole is fabricated to include a first magnetic layer proximate to the main write pole and a second magnetic layer on the first magnetic layer. A width of the first magnetic layer is less than the width of the second magnetic layer, and back edges of the first and second magnetic layers are coplanar. Further, a throat height of the wrap around shield is maintained between the first and the second magnetic layers because their back edges are coplanar.


Find Patent Forward Citations

Loading…