The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2013

Filed:

Sep. 11, 2011
Applicants:

Jason Patrick Henning, Carrboro, NC (US);

Qingchun Zhang, Cary, NC (US);

Sei-hyung Ryu, Cary, NC (US);

Anant Agarwal, Chapel Hill, NC (US);

John Williams Palmour, Cary, NC (US);

Scott Allen, Apex, NC (US);

Inventors:

Jason Patrick Henning, Carrboro, NC (US);

Qingchun Zhang, Cary, NC (US);

Sei-Hyung Ryu, Cary, NC (US);

Anant Agarwal, Chapel Hill, NC (US);

John Williams Palmour, Cary, NC (US);

Scott Allen, Apex, NC (US);

Assignee:

Cree, Inc., Durham, NC (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
Abstract

Elements of an edge termination structure, such as multiple concentric guard rings, are effectively doped regions in a drift layer. To increase the depth of these doped regions, individual recesses may be formed in a surface of the drift layer where the elements of the edge termination structure are to be formed. Once the recesses are formed in the drift layer, these areas about and at the bottom of the recesses are doped to form the respective edge termination elements.


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