The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2013
Filed:
Feb. 16, 2012
Hiromitsu Mashita, Kanagawa, JP;
Toshiya Kotani, Tokyo, JP;
Fumiharu Nakajima, Kanagawa, JP;
Takafumi Taguchi, Kanagawa, JP;
Chikaaki Kodama, Kanagawa, JP;
Hiromitsu Mashita, Kanagawa, JP;
Toshiya Kotani, Tokyo, JP;
Fumiharu Nakajima, Kanagawa, JP;
Takafumi Taguchi, Kanagawa, JP;
Chikaaki Kodama, Kanagawa, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A method of manufacturing a semiconductor device, which forms a pattern by performing pattern transformation steps multiple times, comprises setting finished pattern sizes for patterns to be formed in each consecutive two pattern transformation steps among the plurality of pattern transformation steps based on a possible total amount of in-plane size variation of the patterns to be formed in the consecutive two pattern transformation steps.