The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2013
Filed:
Sep. 28, 2011
Ruilong Xie, Albany, NY (US);
Robert J. Miller, Yorktown Heights, NY (US);
Ruilong Xie, Albany, NY (US);
Robert J. Miller, Yorktown Heights, NY (US);
GLOBALFOUNDRIES, Inc., Grand Cayman, KY;
Abstract
Semiconductor device fabrication methods having enhanced control in recessing processes are provided. In a method for fabricating a semiconductor device or plurality of them, a structure is formed. The method includes preparing a limited amount of the structure having a depth of less than ten atomic layers for removal. Further, the method includes performing a removal process to remove the limited amount of the structure. The method repeats preparation of successive limited amounts of the structure for removal, and performance of the removal process to form a recess at an upper portion of the structure.