The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2013
Filed:
Feb. 15, 2007
Takahiro Senzaki, Kawasaki, JP;
Koichi Misumi, Kawasaski, JP;
Atsushi Yamanouchi, Kawasaki, JP;
Koji Saito, Kawasaki, JP;
Takahiro Senzaki, Kawasaki, JP;
Koichi Misumi, Kawasaski, JP;
Atsushi Yamanouchi, Kawasaki, JP;
Koji Saito, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kanagawa, JP;
Abstract
Problem: Providing a photosensitive resin composition that has high sensitivity, sustains a slight shrinkage in volume when cured under heating and can form resist patterns having high-aspect profiles, and a pattern forming method using such a composition. Means for Resolution: A photosensitive resin composition characterized by containing (a) a polyfunctional epoxy resin, (b) a cationic polymerization initiator and (c) an aromatic polycyclic compound as a sensitizer (such as 2,3-dihydroxynaphthalene, 1,5-dihydroxynaphthalene or 2,6-dihydroxynaphthalene), which has at least two substituents capable of forming cross-links with component (a).