The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2013

Filed:

May. 26, 2006
Applicants:

David Fryer, Hillsboro, OR (US);

Vivek Singh, Portland, OR (US);

Nikolay Suetin, Moscow, RU;

Alex A. Granovsky, Moscow, RU;

Inventors:

David Fryer, Hillsboro, OR (US);

Vivek Singh, Portland, OR (US);

Nikolay Suetin, Moscow, RU;

Alex A. Granovsky, Moscow, RU;

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/38 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/38 (2013.01); G03F 7/039 (2013.01);
Abstract

Two acids may be formed per exposed photon using free radical promotion so that two acid products are produced via two parallel pathways. This results in increased fabrication facility throughput. In some embodiments, this may be achieved while reducing side-lobe defect liability.


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