The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2013

Filed:

May. 21, 2010
Applicants:

Mitsunori Nakamori, Nirasaki, JP;

Akira Fujita, Nirasaki, JP;

Takayuki Toshima, Koshi, JP;

Inventors:

Mitsunori Nakamori, Nirasaki, JP;

Akira Fujita, Nirasaki, JP;

Takayuki Toshima, Koshi, JP;

Assignee:

Tokyo Electron Limited, Minato-Ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/10 (2006.01); B05D 3/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A liquid processing apparatus processes an object to be processed W including a body part Wand a plurality of projecting-shape parts Wdisposed on the body part W, with an inorganic film and a different film being laminated to each other. The liquid processing apparatus comprises: a support partconfigured to support the body part W; a hydrophobic-liquid supply mechanismconfigured to supply a hydrophobic liquid to the object to be processed W; and a rinse-liquid supply partconfigured to supply a rinse liquid to the object to be processed W to which the hydrophobic liquid has been supplied. The hydrophobic-liquid supply mechanismincludes: a first hydrophobic-liquid supply partconfigured to supply a first hydrophobic liquid for making hydrophobic the inorganic film; and a second hydrophobic-liquid supply partconfigured to supply a second hydrophobic liquid for making hydrophobic the different film.


Find Patent Forward Citations

Loading…