The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2013
Filed:
Sep. 21, 2010
Michel Riepen, Veldhoven, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Johannes Catharinus Hubertus Mulkens, Valkenswaard, NL;
Rogier Hendrikus Magdalena Cortie, Ittervoort, NL;
Ralph Joseph Meijers, Kerkrade, NL;
Fabrizio Evangelista, Eindhoven, NL;
Michel Riepen, Veldhoven, NL;
Nicolaas Rudolf Kemper, Eindhoven, NL;
Johannes Catharinus Hubertus Mulkens, Valkenswaard, NL;
Rogier Hendrikus Magdalena Cortie, Ittervoort, NL;
Ralph Joseph Meijers, Kerkrade, NL;
Fabrizio Evangelista, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line, one or more openings in a third line and a second gas knife device having an aperture in a fourth line.