The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
Dec. 12, 2007
Richard Johannes Franciscus Van Haren, Waalre, NL;
Bartolomeus Petrus Rijpers, Nuenen, NL;
Harminder Singh, Avondale, AZ (US);
Gerald Arthur Finken, Woodbury, MN (US);
Richard Johannes Franciscus Van Haren, Waalre, NL;
Bartolomeus Petrus Rijpers, Nuenen, NL;
Harminder Singh, Avondale, AZ (US);
Gerald Arthur Finken, Woodbury, MN (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one region formed by a second material. The first and second materials have different material characteristics with respect to a substrate treatment process such that a step height in a direction substantially perpendicular to the surface of the substrate may be created by applying the substrate treatment process. The second mark can be provided with a second step height by applying the substrate treatment process. The second step height is substantially different from the first step height.