The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
Aug. 22, 2011
Jianming Zhou, Boise, ID (US);
Scott L. Light, Boise, ID (US);
David Kewley, Boise, ID (US);
Prasanna Srinivasan, Boise, ID (US);
Anton Devilliers, Boise, ID (US);
Jianming Zhou, Boise, ID (US);
Scott L. Light, Boise, ID (US);
David Kewley, Boise, ID (US);
Prasanna Srinivasan, Boise, ID (US);
Anton deVilliers, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
Methods of lithography, methods for forming patterning tools, and patterning tools are described. One such patterning tool include an active region that forms a first diffraction image on a lens when in use, and an inactive region that forms a second diffraction image on a lens when in use. The inactive region includes a pattern of phase shifting features formed in a substantially transparent material of the patterning tool. Patterning tools and methods, as described, can be used to compensate for lens distortion from effects such as localized heating.