The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2013
Filed:
Jul. 12, 2010
Applicants:
Dan B. Millward, Boise, ID (US);
Donald Westmoreland, Boise, ID (US);
Gurtej Sandhu, Boise, ID (US);
Inventors:
Dan B. Millward, Boise, ID (US);
Donald Westmoreland, Boise, ID (US);
Gurtej Sandhu, Boise, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods for fabricating sublithographic, nanoscale microstructures arrays including openings and linear microchannels utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. In some embodiments, the films can be used as a template or mask to etch openings in an underlying material layer.
Millward, Dan. (2013). Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces (U.S. Patent No. 8609221). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8609221
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile