The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Oct. 26, 2009
Saeed Bagheri, Yorktown Heights, NY (US);
Kafai Lai, Hopewell Junction, NY (US);
David O. S. Melville, New York, NY (US);
Alan E. Rosenbluth, Yorktown Heights, NY (US);
Kehan Tian, Hopewell Junction, NY (US);
Saeed Bagheri, Yorktown Heights, NY (US);
Kafai Lai, Hopewell Junction, NY (US);
David O. S. Melville, New York, NY (US);
Alan E. Rosenbluth, Yorktown Heights, NY (US);
Kehan Tian, Hopewell Junction, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for illuminating a mask to project a desired image pattern into a photoactive material is described. The method includes receiving an image pattern. Determining a relationship between source pixels in a set of source pixels to desired intensities at one or more points in the image pattern is performed. Linear constraints are imposed on a set of intensity values based on one or more contingent intensity condition. The contingent intensity conditions include integer variables specifying contingent constraints. The method includes determining values of the set of intensity values in accordance with the linear constraints, using a constrained optimization algorithm. The set of intensity values represents intensities of a set of source pixels. The set of intensity values are output. Apparatus and computer readable storage media are also described.