The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Dec. 15, 2008
Olaf Rogalsky, Oberkochen, DE;
Boris Bittner, Roth, DE;
Thomas Petasch, Aalen, DE;
Jochen Haeussler, Hermaringen, DE;
Olaf Rogalsky, Oberkochen, DE;
Boris Bittner, Roth, DE;
Thomas Petasch, Aalen, DE;
Jochen Haeussler, Hermaringen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
Projection objectives, related systems and components, and methods are disclosed. The methods include providing a projection objective of a lithography projection exposure apparatus, where the projection objective includes a plurality of optical elements between an object plane of the projection objective and an image plane of the projection objective, and the plurality of optical elements includes a first optical element having a refractive power and being disposed in the projection objective at a first location. The methods also include removing the first optical element from the projection objective, and inserting a first spare optical element into the projection objective at the first location, where the removing and inserting steps are performed at a location of use of the lithography projection exposure apparatus in a lithography process.