The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2013

Filed:

Aug. 23, 2011
Applicants:

Jeng Hsing Jang, Kaohsiung, TW;

Yi Nan Chen, Taipei, TW;

Hsien Wen Liu, Luzhu Township, Taoyuan County, TW;

Inventors:

Jeng Hsing Jang, Kaohsiung, TW;

Yi Nan Chen, Taipei, TW;

Hsien Wen Liu, Luzhu Township, Taoyuan County, TW;

Assignee:

Nan Ya Technology Corporation, Tao-Yuan, Hsien, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
Abstract

A circuit structure with a capacitor or a resistor includes a semiconductor substrate, a first conductive region positioned in the semiconductor substrate, a plurality of second conductive regions and third conductive regions positioned in the first conductive region, a first depletion region positioned between the first conductive region and the third conductive region, a second depletion region positioned between the second conductive region and the third conductive region, and a plurality of separating regions positioned in the first conductive region, configured to separate the second and the third conductive regions. In operation, a first voltage is applied to the separating region to control the capacitance or the resistance of the circuit structure. A second voltage is applied to the first conductive region and a third voltage is applied to the second conductive region to measure the capacitance and the resistance of the circuit structure.


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