The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Jun. 28, 2011
Richard Anthony Dipietro, Campbell, CA (US);
Urs T. Duerig, Rueschlikon, CH;
Jane Elizabeth Frommer, San Jose, CA (US);
Bernd Walter Gotsmann, Horgen, CH;
James Lipton Hedrick, Pleasanton, CA (US);
Armin W. Knoll, Zurich, DE;
Teddie Peregrino Magbitang, San Jose, CA (US);
Robert Dennis Miller, San Jose, CA (US);
Russell Clayton Pratt, Oakland, CA (US);
Richard Anthony DiPietro, Campbell, CA (US);
Urs T. Duerig, Rueschlikon, CH;
Jane Elizabeth Frommer, San Jose, CA (US);
Bernd Walter Gotsmann, Horgen, CH;
James Lipton Hedrick, Pleasanton, CA (US);
Armin W. Knoll, Zurich, DE;
Teddie Peregrino Magbitang, San Jose, CA (US);
Robert Dennis Miller, San Jose, CA (US);
Russell Clayton Pratt, Oakland, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A composition of matter for a recording medium in atomic force data storage devices. The composition includes one or more poly(aryl ether ketone) copolymers, each of the one or more poly(aryl ether ketone) copolymers including (a) a first monomer including an aryl ether ketone and (b) a second monomer including an aryl ether ketone and a hydrogen bonding cross-linking moiety, the moiety capable of forming two or more hydrogen bonds at room temperature, each of the one or more poly(aryl ether ketone) copolymers having two terminal ends, each terminal end having a phenylethynyl moiety. The covalent and hydrogen bonding cross-linking of the poly(aryl ether ketone) oligomers may be tuned to match thermal and force parameters required in read-write-erase cycles.