The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2013
Filed:
Jun. 28, 2011
Robert David Allen, San Jose, CA (US);
Richard Anthony Dipietro, Campbell, CA (US);
Geraud Jean-michel Dubois, Los Gatos, CA (US);
Mark Whitney Hart, San Jose, CA (US);
Robert Dennis Miller, San Jose, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Robert David Allen, San Jose, CA (US);
Richard Anthony DiPietro, Campbell, CA (US);
Geraud Jean-Michel Dubois, Los Gatos, CA (US);
Mark Whitney Hart, San Jose, CA (US);
Robert Dennis Miller, San Jose, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of forming low dielectric contrast structures by imprinting a silsesquioxane based polymerizable composition. The imprinting composition including: one or more polyhedral silsesquioxane oligomers each having one or more polymerizable groups, wherein each of the one or more polymerizable group is bound to a different silicon atom of the one or more polyhedral silsesquioxane oligomers; and one or more polymerizable diluents, the diluents constituting at least 50% by weight of the composition.